5

A tuned Langmuir probe for measurements in rf glow discharges

Year:
1990
Language:
english
File:
PDF, 1.26 MB
english, 1990
6

In-Situ Monitoring of Electrical Parameters for Dry Etching

Year:
1987
Language:
english
File:
PDF, 452 KB
english, 1987
7

Charging damage to gate oxides in an O2 magnetron plasma

Year:
1992
Language:
english
File:
PDF, 1.16 MB
english, 1992
14

A comparison of backcross and selfing methods for telocentric mapping in wheat

Year:
1978
Language:
english
File:
PDF, 112 KB
english, 1978
15

Thin Oxide Defects Resulting from Plasma Induced Wafer Charging

Year:
1992
Language:
english
File:
PDF, 273 KB
english, 1992
16

Plasma Mode Trench Etching with Direct Hydrocarbon Injection

Year:
1986
Language:
english
File:
PDF, 949 KB
english, 1986
22

Mechanism of Surface Charging Effects on Etching Profile Defects

Year:
1994
Language:
english
File:
PDF, 2.07 MB
english, 1994
25

Model for oxide damage from gate charging during magnetron etching

Year:
1993
Language:
english
File:
PDF, 533 KB
english, 1993
28

Algorithms for numerical simulation of radio-frequency glow discharges

Year:
1990
Language:
english
File:
PDF, 709 KB
english, 1990
31

Plasma induced wafer charging sensor

Year:
1998
Language:
english
File:
PDF, 886 KB
english, 1998